The Enhanced Etch Sensor delivers low-pressure control for next-generation process nodes by providing a 5x decrease in drift associated with fluorine used in etch, including atomic layer etch applications. (NASDAQ: MKSI), a global provider of technologies that enable advanced processes and improve productivity, today announced the release of its revolutionary Enhanced Etch Sensor for the Baratron® E28 and DA02capacitance manometer product line. Delivers improved etch process control for next-generation process nodesĪndover, Mass., – J– MKS Instruments, Inc.
0 kommentar(er)
